Ag nano-particles have been synthesized and the formation and microstructure of Ag particles, were monitored by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-Visible spectrum and z-scan technique. XRD pattern confirmed the cubic structure of the synthesized material. The UV-Visible spectrum of this material shows an absorption peak about 200 nm wavelengths. Optical limiting (OL) property of Ag nano-particles is studied. The nonlinear refractive indices of Ag nano-particles were defined by the z-scan technique using CW He-Ne laser (λ = 632.8 nm) at different incident intensities. The results reveal that the new complex exhibits strong nonlinear optics refraction effect such as self-focusing and the magnitude of n2 was measured in order of 10−7 (cm2/W) with a negative sign.
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2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems
June 3–5, 2008
Clear Water Bay, Kowloon, Hong Kong
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4294-0
PROCEEDINGS PAPER
Nonlinear Responses and Optical Limiting Behavior of Ag Nano-Particles
M. H. Majles Ara
,
M. H. Majles Ara
Tarbiat Moallem University, Tehran, Iran
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Z. Dehghani
,
Z. Dehghani
Tarbiat Modares University, Tehran, Iran
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E. Saievar Iranizad
,
E. Saievar Iranizad
Tarbiat Modares University, Tehran, Iran
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S. Salmani
S. Salmani
Tarbiat Moallem University, Tehran, Iran
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M. H. Majles Ara
Tarbiat Moallem University, Tehran, Iran
Z. Dehghani
Tarbiat Modares University, Tehran, Iran
E. Saievar Iranizad
Tarbiat Modares University, Tehran, Iran
S. Salmani
Tarbiat Moallem University, Tehran, Iran
Paper No:
MicroNano2008-70174, pp. 257-260; 4 pages
Published Online:
June 12, 2009
Citation
Majles Ara, MH, Dehghani, Z, Saievar Iranizad, E, & Salmani, S. "Nonlinear Responses and Optical Limiting Behavior of Ag Nano-Particles." Proceedings of the 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. 2008 Second International Conference on Integration and Commercialization of Micro and Nanosystems. Clear Water Bay, Kowloon, Hong Kong. June 3–5, 2008. pp. 257-260. ASME. https://doi.org/10.1115/MicroNano2008-70174
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