MEMS (MicroElectroMechanical Systems) are composed of thin films and composite nanomaterials. Although the mechanical properties of their constituent materials play an important role in controlling their quality, reliability, and lifetime, they are often found to be different from their bulk counterparts. In this paper, low- porous silica thin films spin coated on silicon substrates are studied. The roughness of spin-on coated porous silica films is analyzed with in-situ imaging and their mechanical properties are determined using nanoindentation. A Berkovich type nanoindenter, of a 142.3 deg total included angle, is used and continuous measurements of force and displacements are acquired. It is shown, that the measured results of hardness and Young’s modulus of these films depend on penetration depth. Furthermore, the film’s mechanical properties are influenced by the properties of the substrate, and the reproduction of the force versus displacement curves depends on the quality of the thin film. The hardness of the studied low- spin coated silica thin film is measured as 0.35∼0.41 GPa and the Young’s modulus is determined as 2.74∼2.94 GPa.
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e-mail: pelegri@jove.rutgers.edu
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October 2003
Technical Papers
Nanoindentation Measurements on Low-k Porous Silica Thin Films Spin Coated on Silicon Substrates
Xiaoqin Huang,
Xiaoqin Huang
Mechanical & Aerospace Engineering Department, 98 Brett Road, Rutgers, The State University of New Jersey, Piscataway, NJ 08854, USA
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Assimina A. Pelegri
e-mail: pelegri@jove.rutgers.edu
Assimina A. Pelegri
Mechanical & Aerospace Engineering Department, 98 Brett Road, Rutgers, The State University of New Jersey, Piscataway, NJ 08854, USA
Search for other works by this author on:
Xiaoqin Huang
Mechanical & Aerospace Engineering Department, 98 Brett Road, Rutgers, The State University of New Jersey, Piscataway, NJ 08854, USA
Assimina A. Pelegri
Mechanical & Aerospace Engineering Department, 98 Brett Road, Rutgers, The State University of New Jersey, Piscataway, NJ 08854, USA
e-mail: pelegri@jove.rutgers.edu
Contributed by the Materials Division for publication in the JOURNAL OF ENGINEERING MATERIALS AND TECHNOLOGY. Manuscript received by the Materials Division December 15, 2002; revision received June 17, 2003. Associate Editor: A. Karlsson.
J. Eng. Mater. Technol. Oct 2003, 125(4): 361-367 (7 pages)
Published Online: September 22, 2003
Article history
Received:
December 15, 2002
Revised:
June 17, 2003
Online:
September 22, 2003
Citation
Huang , X., and Pelegri, A. A. (September 22, 2003). "Nanoindentation Measurements on Low-k Porous Silica Thin Films Spin Coated on Silicon Substrates ." ASME. J. Eng. Mater. Technol. October 2003; 125(4): 361–367. https://doi.org/10.1115/1.1605109
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